首页> 外文会议>Symposium on Thin Films: Stresses and Mechanical Properties IX, Nov 26-30, 2001, Boston, Massachusetts, U.S.A. >Assessment of New Relation for the Elastic Compliance of a Film-Substrate System
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Assessment of New Relation for the Elastic Compliance of a Film-Substrate System

机译:评估薄膜-基材系统弹性顺应性的新关系

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摘要

A new closed-form relation for the elastic compliance of a film-substrate system indented by a flat cylindrical punch is presented. The relation is an extension of the work of Gao at al. modified to increase the applicable range of modulus mismatch between the film and substrate. The accuracy of the relation is assessed by comparison to finite element simulations, other approximate numerical solutions, and nanoindentation experiments performed on a fluorinated silicate glass (FSG) film on a silicon substrate. The benefits and limitations of the relation are discussed.
机译:提出了一种新的闭合形式的关系,该关系用于由扁平圆柱冲头压入的薄膜-基材系统的弹性柔度。这种关系是高等人工作的延伸。进行改进以增加薄膜和基材之间模量不匹配的适用范围。通过与有限元模拟,其他近似数值解以及在硅基板上的氟化硅酸盐玻璃(FSG)膜上进行的纳米压痕实验进行比较,可以评估这种关系的准确性。讨论了这种关系的好处和局限性。

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