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Does CdTe Deposition Affect the Impurity Profile in Sputtered CdS Window Layers?

机译:CdTe沉积会影响溅射的CdS窗口层中的杂质分布吗?

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We report a multi-element study of impurities in CdS window layers by dynamic and quantitative SMS. Two CdS/TCO/glass samples, grown separately using nominally the same conditions, were considered. In_2O_3:F grown on soda lime glass was used as TCO followed by a sputtered CdS layer. One of the samples was subsequently used as a substrate for growth of CdTe by CSS. SMS was carried out on both samples, and O, Na, Si, Cl, Sb, In, Zn, Sn, Pb, Cu, Te, S and Cd were depth profiled. It was shown that before CdTe growth, most of the impurity elements showed flat levels in the CdS ranging from 2-3x10~(20) cm~(-3) for Zn and O to 2-3x10~(17) cm~(-3) for Na, Cl, Sb and Te. Si was found to segregate at the CdS/TCO interface with a maximum level of 10~(18) cm~(-3). However, following CdTe growth, the impurities in the CdS layer showed higher concentrations and different profile shape compared to those before CdTe growth. Some of the impurities also showed a diffusion-like profile following the CdTe growth as compared to before. Possible explanations of these changes are discussed in terms of the purity of the starting materials and the growth environments, as well as the diffusion from the TCO and glass.
机译:我们通过动态和定量SMS报告了CdS窗口层中杂质的多元素研究。考虑使用名义上相同的条件分别生长的两个CdS / TCO /玻璃样品。在钠钙玻璃上生长的In_2O_3:F用作TCO,然后溅射CdS层。样品之一随后用作CSS生长CdTe的底物。在两个样品上均进行了SMS,并对O,Na,Si,Cl,Sb,In,Zn,Sn,Pb,Cu,Te,S和Cd进行了深度剖析。结果表明,在CdTe生长之前,大多数杂质元素在CdS中呈现出平坦的水平,从Zn和O的2-3x10〜(20)cm〜(-3)到2-3x10〜(17)cm〜(- 3)用于Na,Cl,Sb和Te。发现Si在CdS / TCO界面处偏析,最大水平为10〜(18)cm〜(-3)。然而,在CdTe生长之后,与CdTe生长之前相比,CdS层中的杂质显示出更高的浓度和不同的轮廓形状。与以前相比,某些杂质在CdTe生长后也表现出扩散状分布。根据原材料的纯度和生长环境,以及从TCO和玻璃中的扩散,讨论了这些变化的可能解释。

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