【24h】

Ion Implantation Synthesis and Characterization of Cobalt Nanodots

机译:离子注入钴纳米点的合成与表征

获取原文
获取原文并翻译 | 示例

摘要

A study of the synthesis of Co nanodots by ion implantation was carried out. Silica was implanted with 35 keV Co~+ ion beams with doses of 8x10~(15), 3x10~(16) and 1x10~(17) at/cm~2 and transmission electron microscopy revealed the presence of spherical nanodots in these samples. Annealing in vacuum at 900 ℃ was used to change the size distribution of the nanodots. The annealed samples presented an absorption band related to the plasmon collective excitation of the metallic nanodots that redshifted for higher Co contents. The magnetic character of the samples was revealed by magnetic force microscopy measurements that showed the presence of randomly distributed structures with defined magnetization in the case of annealed samples. This work shows the feasibility of synthesizing Co nanodots with controlled size distribution.
机译:进行了通过离子注入合成Co纳米点的研究。硅胶被注入35 keV Co〜+离子束,剂量分别为8x10〜(15),3x10〜(16)和1x10〜(17)at / cm〜2,并且透射电子显微镜显示这些样品中存在球形纳米点。在900℃的真空中进行退火以改变纳米点的尺寸分布。退火后的样品呈现出与金属纳米点的等离激元集体激发有关的吸收带,该金属纳米点因较高的Co含量而红移。通过磁力显微镜测量揭示了样品的磁性,在退火样品的情况下,该测量表明存在具有确定磁化强度的随机分布结构。这项工作表明了合成具有受控尺寸分布的Co纳米点的可行性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号