首页> 外文会议>Symposium on Nanopatterning―From Ultralarge-Scale Integration to Biotechnology, Nov 25-29, 2001, Boston, Massachusetts, U.S.A. >Nanofabrication at Biologically Important Length Scale: Etching of Dislocation Array in Twist-bonded Bicrystals
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Nanofabrication at Biologically Important Length Scale: Etching of Dislocation Array in Twist-bonded Bicrystals

机译:在生物学上重要的长度尺度上的纳米加工:扭曲结合双晶体中位错阵列的蚀刻。

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摘要

A process to fabricate a periodic surface structure at biologically important length scale is developed and nanostructured silicon surface with a periodicity of 38 nm has been obtained. The technique relies on controlled etching of a dislocation array in the twist boundaries formed by silicon bicrystals. The deviation from a perfect periodic structure and the method to improve the perfection have been investigated.
机译:开发了一种在生物学上重要的长度尺度上制备周期性表面结构的方法,并获得了具有38 nm周期性的纳米结构硅表面。该技术依赖于在由硅双晶形成的扭曲边界中对位错阵列的受控蚀刻。研究了偏离理想周期结构的方法和改善理想周期的方法。

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