首页> 外文会议>Symposium on Microcrystalline and Nanocrystalline Semiconductors-1998 held November 30-December 3, 1998, Boston, Massachusetts, U.S.A. >Integration of multilayers in Er-doped porous silicon structures and advances in 1.5 #mu#m optoelectronic devices
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Integration of multilayers in Er-doped porous silicon structures and advances in 1.5 #mu#m optoelectronic devices

机译:掺Er多孔硅结构中多层的集成及其在1.5#μm光电器件中的进展

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Infrared photoluminescence (PL) and electroluminescence (EL) from erbium-doped porous silicon (PSi) structures are studied. The PL and EL from the Er-doped PSi structures and the absence of silicon band edge recombination, point defect, and dislocation luminescence bands suggest that the Er-complex centers are the most efficient recombination sites. PSi multilayers with very high reflectivity (R >=90percent) in the 1.5 #mu#m range have been incorporated in the structures resulting in a PL enhancement of over 100percent. Stable and intense EL is obtained from the Er-doped structures. The EL spectrum is similar to that of the PL, but shifted towards higher energy. The unexpected shift in emission opens up the possibility for erbium related luminescence to encompass a larger part of the optimal wavelength window for fiber optic communications.
机译:研究了掺porous多孔硅(PSi)结构的红外光致发光(PL)和电致发光(EL)。来自掺Er的PSi结构的PL和EL以及硅带边缘重组,点缺陷和位错发光带的缺失表明,Er复合中心是最有效的重组位点。在结构中引入了在1.5#mu#m范围内具有很高反射率(R> = 90%)的PSi多层,导致PL增强了100%以上。从掺Er的结构获得稳定而强烈的EL。 EL光谱类似于PL的光谱,但是向更高的能量转移。发射的意外变化为与related有关的发光涵盖了光纤通信最佳波长窗口的较大部分提供了可能性。

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