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Ferromagnetic NiMnGa and CoNiGa Shape Memory Alloy Films

机译:铁磁NiMnGa和CoNiGa形状记忆合金膜

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摘要

This paper reports results on Heusler-type NiMnGa and CoNiGa ferromagnetic shape memory alloy films deposited by magnetron sputtering and pulsed laser deposition respectively, on silicon cantilever-type substrates. NiMnGa FMSMA films deposited by magnetron sputtering on silicon substrates show good ferromagnetic and shape memory properties if the substrate is heated above 350℃ or if the films deposited at RT are annealed above 600℃. The growth of the film is columnar. TEM examination shows typical martensitic variants while the SAED pattern suggests an orthorhombic structure. CoNiGa FMSMA films deposited at 550℃ by PLD are crystalline. Mechanical spectroscopy data proves the presence of a typical martensitic transformation that develops below room temperature: the phase transitions manifest themselves by typical changes of the modulus defect and displacement vs. temperature characteristics similar to those associated with the martensitic transformation in known shape memory alloy films. The change in the elastic modulus as a function of the magnetic field suggests that in both NiMnGa and CoNiGa films the spontaneous magnetization is clamped by the magnetic anisotropy field.
机译:本文报道了通过磁控溅射和脉冲激光沉积分别在硅悬臂式基板上沉积的Heusler型NiMnGa和CoNiGa铁磁形状记忆合金膜的结果。如果将衬底加热到​​350℃以上或将在室温下沉积的薄膜退火到600℃以上,则通过磁控溅射在硅衬底上沉积的NiMnGa FMSMA膜将显示出良好的铁磁和形状记忆性能。膜的生长是柱状的。 TEM检查显示出典型的马氏体变体,而SAED模式显示出正交结构。 PLD在550℃下沉积的CoNiGa FMSMA膜是结晶的。机械光谱数据证明存在在室温以下发展的典型马氏体相变:相变通过模量缺陷和位移-温度特性的典型变化而表现出来,类似于已知形状记忆合金膜中与马氏体相变有关的变化。弹性模量随磁场的变化表明,在NiMnGa和CoNiGa膜中,自发磁化强度都受到磁场各向异性的限制。

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