首页> 外文会议>Symposium on Materials and Devices for Silicon-Based Optolelectronics held December 1-3, 1997, Boston, Masachusetts, U.S.A. >Amorphous silicon based waveguides and light modulators for silicon low-cost photonic integrated circuits
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Amorphous silicon based waveguides and light modulators for silicon low-cost photonic integrated circuits

机译:用于非晶硅低成本光子集成电路的非晶硅基波导和光调制器

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This paper reports about the fabrication and experimental test of an interferometric light intensity modulator integrated in a low loss (0.7 dB/cm), amorphous silicon based waveguide. It measures approximately 1 mm in length, while its cross section is 30- um m-wide and 3- um m-high. The device, which exploits the strong thermo-optic effect in thin film -Si for its operation, is designed for application at the infrared wavelengths of 1.3 and 1.55 um m. The measured maximum operating on-off switching frequency of the device is 600 kHz. The very simple fabrication technology involves maximum process temperatures of 230 deg C, and is therefore compatible with the standard microelectronic technology. This offers a new opportunity for the integration of optical and electronic functions on the same substrate.
机译:本文报道了集成在低损耗(0.7 dB / cm),基于非晶硅的波导中的干涉光强度调制器的制造和实验测试。它的长度约为1毫米,而横截面的宽度为30微米,高度为3微米。该器件在薄膜-Si中发挥了强大的热光效应,因此可以在1.3和1.55um的红外波长下使用。测得的设备最大工作开关频率为600 kHz。非常简单的制造技术涉及230摄氏度的最高工艺温度,因此与标准微电子技术兼容。这为在同一基板上集成光学和电子功能提供了新的机会。

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