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Band-bending effects on field electron emission from N-and P-type silicon gated emitter tips

机译:N和P型硅门控发射极尖端对场电子发射的能带弯曲效应

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Field emission characteristics from n-and p-type silicon gated emitter tips have been investigated in detail by means of experiments and theoretical estimation of band-bending induced by surface states. SIngle-tip emitters have been fabricated from n-and p-type silicon and their current-voltage characteristics have been evaluated. The field emission from the p-type emitter has been found to occur at lower extraction voltage than that of the n-type emitter. As the theoretical approach to the origin of the phenomena, potential distributon in the emitter tips has been calculated by using device simulation technique. The surface states of the n-type emitter tip are negatively charged and form a potential barrier against the electrons. On the contrary, there is no potential barrier in the p-type tips. The potential barrier in the n-type tip prevents electrons rom reaching the tip apex. This is the reason why the emission current of the n-type emitter was suppressed lower than that of the p-type emitter.
机译:通过实验和表面态引起的能带弯曲的理论估计,详细研究了n型和p型硅门控发射极的场发射特性。 SIngle-tip发射极由n型和p型硅制成,并已对其电流-电压特性进行了评估。已经发现,来自p型发射器的场发射发生在比n型发射器低的提取电压下。作为现象起源的理论方法,已经通过使用器件仿真技术来计算发射器尖端中的电位分布。 n型发射器尖端的表面状态带负电,并形成对电子的势垒。相反,p型尖端没有潜在的障碍。 n型尖端中的势垒可防止电子rom到达尖端顶点。这就是为什么将n型发射极的发射电流抑制得比p型发射极的发射电流低的原因。

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