首页> 外文会议>Symposium on Continuous Nanophase and Nanostructured Materials; 20031201-20031205; Boston,MA; US >In-situ Observation of Formation Processes of Anodic Porous Alumina on a Si Substrate Using Infrared Absorption Spectroscopy
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In-situ Observation of Formation Processes of Anodic Porous Alumina on a Si Substrate Using Infrared Absorption Spectroscopy

机译:利用红外吸收光谱法原位观察硅基阳极多孔氧化铝的形成过程

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We investigated formation processes of a porous anodic alumina film on a p-type silicon (Si) substrate using infrared absorption spectroscopy in the multiple internal reflection geometry (MIR-IRAS). We observed drastic IR spectral changes when porous anodic alumina film approached interfaces between an aluminum (Al) layer and a Si substrate. The intensity of the IR absorption peaks due to water (H_2O) molecules and silicon oxides (SiO_2) increased simultaneously with a spike of anodic current density. The IR spectral changes indicated that the penetration of electrolytes brought about inhomogeneous oxidation of a Si substrate surface. We observed that the arrangement of the SiO_2 nanodots closely reflected that of pores of a porous anodic alumina film. IR absorption peaks due to porous anodic alumina finally disappeared. The formation of SiO_2 nanodots on a Si substrate promoted penetration of electrolytes to peel the porous anodic alumina film off it.
机译:我们使用红外吸收光谱技术在多重内反射几何结构(MIR-IRAS)中研究了p型硅(Si)衬底上的多孔阳极氧化铝膜的形成过程。当多孔阳极氧化铝膜接近铝(Al)层和Si基板之间的界面时,我们观察到剧烈的IR光谱变化。由于水(H_2O)分子和氧化硅(SiO_2)引起的IR吸收峰的强度与阳极电流密度的峰值同时增加。红外光谱的变化表明,电解质的渗透导致硅衬底表面的氧化不均匀。我们观察到,SiO_2纳米点的排列紧密地反映了多孔阳极氧化铝膜孔的排列。最终由于多孔阳极氧化铝而产生的IR吸收峰消失了。在硅基底上形成SiO_2纳米点促进了电解质的渗透,从而将多孔阳极氧化铝膜从其上剥离下来。

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