Electrodeposition of Zn-Sb Thermoelectric Semiconductor Film in Ethylene Glycol Non-Aqueous Solution Containing Zn(II) and Sb(III)

摘要

The electrodeposition of zinc-antimony thermoelectric semiconductor film was investigated in ethylene glycol (EG) solutions containing ZnCl_2 and SbCl_3 or antimony potassium tartrate (APT) at 393 K. In the electrodeposition using the EG-ZnCl_2-SbCl_3 baths, it was difficult to control the composition of the Zn-Sb films. In contrast, Zn-Sb alloy films containing 5-96 mol% Zn were obtained in the baths using APT as the antimony ion source. The composition of the electrodeposit could be controlled easily by the current density and the concentration of the bath. Zn-Sb (55.3-44.7 mol%Sb alloy film was obtained in the EG-ZnCl_2-APT (85.0-14.5-0.5 mol%) bath at the current density of 100 Am~(-2) at 393 K, and its Seebeck coefficient was 159 μV K~(-1).