Direct Measurement of Ion Current Density as a Control Parameter for Ion-assisted Deposition Using an End-hall Ion Source

摘要

Control of an Ion Assisted Deposition (IAD) process is improved by directly measuring the ion current density at the substrate using a novel ion detector. This study reports the use of the detector in the control of thin film processes, with an emphasis on the production of titanium dioxide films by IAD. Trends in the thin film quality are explained in terms of the ion dose, ion energy and gas composition.