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Transparent, Abrasion Resistant Coatings on Plastic and Metal Substrates

机译:塑料和金属基材上的透明,耐磨涂层

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Plastic and metal materials have different but excellent and valuable properties. For spreading to more applications harder surface resulting in improved abrasion resistance without essential changing of optical properties is requested.Transparent oxide layers on large area substrates like plastic films and sheets and metal foils and sheets can be deposited by high rate plasma activated deposition technology with high productivity. Application of HAD (Hollow cathode arc Activated Deposition) process with EB evaporation of silicon dioxide and organic modification of layer material by introduction of monomer in the evaporation process results in excellent adaptation of oxide layer properties to plastic and metal substrates as well. Despite the low condensation temperature requested for plastic materials, the plasma activation results in dense and glassy amorphous layers. The layer hardness on plastic substrates ranges between 2 ... 3 Gpa. Organic modification results in improved elasticity essential for crack-free performance of layers despite the strong mismatch in thermal expansion coefficient.Coating of metal substrates gives much more freedom for process parameters. With higher substrate temperature and much higher degree of plasma activation the SiO_x layer hardness can be improved to 15 Gpa. Absorption coefficient can be kept low for whole hardness range.
机译:塑料和金属材料具有不同但优异而有价值的特性。为了扩展到更多的应用中,需要在不改变光学性能的前提下提高硬质表面的耐磨性。可以通过高速率等离子活化沉积技术以高沉积速率沉积大面积基材上的透明氧化物层,例如塑料薄膜和薄片以及金属箔和薄片生产率。 HAD(空心阴极电弧活化沉积)工艺的应用与二氧化硅的EB蒸发以及通过在蒸发工艺中引入单体对层材料进行有机改性而实现的氧化层特性也非常适合塑料和金属基材。尽管塑料材料要求较低的冷凝温度,但等离子体活化仍会导致致密且玻璃态的无定形层。塑料基材上的层硬度在2到3 Gpa之间。尽管热膨胀系数存在严重的不匹配,但有机改性仍可提高层的无裂纹性能所必需的弹性。金属基底的涂层为工艺参数提供了更大的自由度。随着更高的基板温度和更高的等离子体活化程度,SiO_x层硬度可以提高到15 Gpa。在整个硬度范围内,吸收系数可以保持较低。

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