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Laser ablation of TiO_(2-2x)N_x targets for efficient N-doping into Anatase TiO2 photo-catalytic films

机译:激光烧蚀TiO_(2-2x)N_x靶以有效地将N掺杂到锐钛矿型TiO2光催化膜中

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Among the well-known photo-catalytic materials, the anatase TiO2 is the most promising in terms of its chemicalstability and high reactivity. It is known that the photo-catalytic activity under the visible light irradiation can beenhanced by nitrogen doping into the anatase, because the substitutional nitrogen produces an impurity state whichabsorbs the visible light. In this paper, we will report on the properties of the nitrogen doped films with different dopantconcentrations. The anatase films are prepared by KrF excimer pulsed-laser ablation of TiO2-xNx targets. The films aredeposited on the (100) LaAlO3 substrate which has a good lattice matching with anatase (~ 0.2%). First, we discussthe optimization of the growth conditions. To prepare the nitrogen doped anatase thin films, we have developed a lowtemperatureepitaxy. The growth of anatase-type TiO2 was confirmed using an x-ray diffraction (XRD). The nitrogenincorporation was evaluated by an x-ray photoemission spectroscopy (XPS). The as-grown films have very smoothsurface and exhibit good amphiphilic properties. Then, we present the photo-catalytic activity of the films. The nitrogendoping concentration was varied by adjusting the amount of nitrogen in the ablation targets. The photo-catalytic activitywas measured by the decomposition rate of methylene blue solution under a fluorescent light illumination.
机译:在众所周知的光催化材料中,锐钛矿型TiO2就其化学稳定性和高反应性而言是最有前途的。已知通过将氮掺杂到锐钛矿中可以提高可见光照射下的光催化活性,因为取代氮产生吸收可见光的杂质状态。在本文中,我们将报告不同掺杂浓度的氮掺杂薄膜的性能。通过TiO2-xNx靶的KrF准分子脉冲激光烧蚀制备锐钛矿膜。将膜沉积在(100)LaAlO3衬底上,该衬底具有与锐钛矿(〜0.2%)良好的晶格匹配。首先,我们讨论了生长条件的优化。为了制备氮掺杂的锐钛矿薄膜,我们开发了一种低温表观方法。使用X射线衍射(XRD)确认了锐钛矿型TiO 2的生长。通过X射线光发射光谱法(XPS)评估氮的掺入。所生长的膜具有非常光滑的表面并显示出良好的两亲性。然后,我们介绍了膜的光催化活性。通过调节烧蚀靶中的氮量来改变氮掺杂浓度。通过亚甲基蓝溶液在荧光灯照射下的分解速率来测量光催化活性。

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