【24h】

TRIBOLOGICAL CHARACTERISTICS OF ELID-GROUND HARD FILM (TiAlN)

机译:硬地膜(TiAlN)的摩擦学特性

获取原文
获取原文并翻译 | 示例

摘要

This paper presents the results of electrolytic in-process dressing (ELID) grinding experiments performed on TiAlN film and characterization of the tribological characteristics of the produced films. In advanced films coated by physical vapor deposition, such as CrN and TiAlN, the low surface roughness required for attaining superior tribological characteristics is difficult to attain by use of only a coating process. ELID of grinding wheels improves wheel performance, enabling the attainment of specular finishes on brittle materials, with surface roughness on the nanometer scale (4 to 6 nm). In the present study, high-quality TiAlN film surfaces were fabricated by the ELID technique, typically achieving a surface roughness of around Ra 0.0024 μm by employment of a #30000 wheel. Scanning electron microscopy reveals that ELID improved the finish, as indicated by the shape of grinding marks. Chemical element analysis by an energy-dispersed x-ray diffraction system suggests that ELID grinding formed an oxide layer in the machined surface of TiAlN film. Therefore, in addition to the highly smooth surface, an oxide layer formed by ELID grinding imparts superior tribological properties to ELID-ground TiAlN film.
机译:本文介绍了在TiAlN薄膜上进行的电解过程修整(ELID)研磨实验的结果,以及所生产薄膜的摩擦学特性。在通过物理气相沉积涂覆的高级膜中,例如CrN和TiAlN,仅通过涂覆工艺很难获得获得优异的摩擦学特性所需的低表面粗糙度。砂轮的ELID改善了砂轮的性能,可以在脆性材料上获得镜面光洁度,其表面粗糙度为纳米级(4至6 nm)。在本研究中,通过ELID技术制造了高质量的TiAlN膜表面,通过使用#30000砂轮通常可实现约0.0024μm的表面粗糙度。扫描电子显微镜显示,ELID可以改善表面质量,如磨痕形状所示。通过能量分散x射线衍射系统进行的化学元素分析表明,ELID研磨在TiAlN膜的机加工表面形成了一层氧化层。因此,除了高度光滑的表面之外,通过ELID研磨形成的氧化物层还为ELID研磨的TiAlN膜赋予了优异的摩擦学性能。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号