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ELECTRODEPOSITION OF WHITE GOLD ALLOYS FOR DECORATIVE APPLICATIONS

机译:用于装饰应用的白金合金的电沉积

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摘要

Electrodeposited gold-tin and gold-silver-tin alloys are addressed as possible candidates for white gold alloys plating. An alternative, cyanide-free and acidic plating bath chemistry is considered using thiourea as ligand for Au(I), sulphuric or sulpharnic acid, and alloying metal cations. Process development is discussed with emphasis on the peculiarities of the cathodic electrochemical behaviour of the acid thiourea electrolyte. Electrodeposited coatings with bright and pleasant appearance can be obtained from the proposed baths, though limited in thickness, with composition in the range 14 to 22 carats. Thiourea based electrolytes are a possible alternative to cyanide and sulphite baths for Au alloys electrodeposition; further development is required for improvements in electrolyte stability and process control.
机译:电沉积的金-锡和金-银-锡合金被认为是镀白金合金的可能候选物。考虑使用硫脲作为Au(I),硫酸或亚磺酸和金属合金阳离子的配体,可以选择一种无氰化物的酸性电镀液。讨论了工艺开发,重点是酸性硫脲电解质的阴极电化学行为的特点。尽管厚度有限,但可以从提出的浴中获得具有明亮和令人愉悦外观的电沉积涂层,其组成范围为14至22克拉。基于硫脲的电解质可能替代氰化物和亚硫酸盐浴,用于金合金的电沉积。需要进一步开发以改善电解质稳定性和过程控制。

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