首页> 外文会议>RadTech 2002 the Premier UV/EB Conference amp; Exhibition, Apr 28-May 1, 2002, Indianapolis, IN, U.S.A. >Modeling of Photobleaching for Photoinitiation of Thick Polymerization Systems
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Modeling of Photobleaching for Photoinitiation of Thick Polymerization Systems

机译:厚聚合体系光引发的光漂白建模

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In this contribution, we present a mathematical modeling of the spatial and temporal variations in the light intensity, initiator concentration, and initiation rate for photobleaching initiator systems. Effects of absorption by the initiator fragments, absorption by the monomer, and diffusion of the initiator are included. The results indicate that the initiation rate profile resembles a wave-front, which propagates through the sample, and that there is an optimum initiator concentration for efficient photopolymerization of thick samples. If either the initiator concentration or molar absorptivity is increased, the initiation rate at the peak of the wave-front increases, the breadth of the propagating front decreases, and the rate of spatial propagation through the sample decreases. However, the maximum photoinitiation rate and rate of spatial propagation of the initiation front are simultaneously increased by increasing the initiator quantum yield or by decreasing the absorptivity of the monomer or photolysis products.
机译:在此贡献中,我们提出了光漂白引发剂系统的光强度,引发剂浓度和引发速率的时空变化的数学模型。包括引发剂碎片的吸收,单体的吸收和引发剂的扩散的影响。结果表明,起始速率分布类似于波前,其传播通过样品,并且存在用于厚样品的有效光聚合的最佳引发剂浓度。如果增加了引发剂浓度或摩尔吸收率,则波前峰值处的引发速率会增加,传播前沿的宽度会减小,并且穿过样品的空间传播速率会降低。然而,通过增加引发剂量子产率或通过降低单体或光解产物的吸收率,同时增加了最大光引发速率和引发前沿的空间传播速率。

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