首页> 外文会议>Radio Frequency Integrated Circuits Symposium (RFIC), 2012 IEEE >A wideband gain-boosting 8mW LNA with 23dB gain and 4dB NF in 65nm CMOS process for 60 GHz applications
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A wideband gain-boosting 8mW LNA with 23dB gain and 4dB NF in 65nm CMOS process for 60 GHz applications

机译:用于60 GHz应用的65nm CMOS工艺具有23dB增益和4dB NF的宽带增益提升8mW LNA

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摘要

A three stage single-ended LNA using transformer (TF) matching and gain-boosting by capacitive feedback for wideband operation in the 57–66GHz band is presented. The LNA, fabricated in a 65nm standard CMOS process, achieves a 23dB-gain 4dB NF at 6mA and 1.25V supply, with 2dBm Psat and 0.05mm2 in size, demonstrating best reported noise figure, gain, power consumption and chip area compared to published 60 GHz LNAs. Different neutralization topologies were analyzed and compared based on analytical TF models that were created. Optimal gain-boosting is achieved by capacitive feedback after a 180-deg TF together with special decoupling capacitors of MOM and MOS stacked types.
机译:提出了一个三级单端LNA,它使用变压器(TF)匹配和电容反馈来增加增益,以在57-66GHz频带中进行宽带操作。该LNA采用65nm标准CMOS工艺制造,在6mA和1.25V电源下实现了23dB的增益4dB NF,尺寸为2dBm Psat和0.05mm 2 ,展示了最佳的报告噪声系数,增益,与公布的60 GHz LNA相比,功耗和芯片面积更大。基于创建的分析TF模型,分析和比较了不同的中和拓扑。通过在180度TF之后的电容性反馈以及MOM和MOS堆叠类型的专用去耦电容器,可以实现最佳的增益提升。

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