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Application of Defect Induced Microwave Band Gap Structure for Non-destructive Evaluation and the Construction of a FrequencySelector Switch

机译:缺陷感应微波带隙结构在无损评估中的应用及选频开关的构建

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The use of microwave band gap structures for the non-destructive evaluation of material property is being probed in this paper. As a first step, we studied numerically, the appearance of a point defect mode within the band gap of a microwave band gap structure for the use as a tool to evaluate the dielectric constant of the material at the defect site. The simulations were carried out using the FEMLAB software. In a pure 10 × 10 square lattice constructed with a material of dielectric constant (ε) 5.5 (in the form of a right circular cylinder), a point defect is created by replacing one of the rods with a geometrically similar but with different dielectric constant material. The appearance of the defect mode is governed by the refractive index contrast (denned as the ratio between the refractive index of the material at the defect site (n_d) and the material of the lattice (n_l). In this case, the refractive index contrast (n_d_l) was found to be between 0.85 and 1.28. Simulations were also done with the lattice material of dielectric constant 10 and the defect mode appeared for 1.18 < n_d_l < 0.84. For the contrast less than 1, defect creates the fundamental mode similar to TE_(01) mode whereas for the contrast greater than 1, next higher mode similar to TE_(11) appears. Once a defect mode appears, it moves towards lower frequency as the dielectric constant of the defect site is increased. In this paper, we propose to evaluate the dielectric constant of a material using the above procedure. This paper also proposes the construction of a novel frequency selector switch that has two line defects in a 10 × 20 square lattice structure constructed with material of dielectric constant 10.
机译:本文探讨了使用微波带隙结构进行材料性能的无损评估。第一步,我们进行了数值研究,即在微波带隙结构的带隙内出现点缺陷模式,以用作评估缺陷部位材料介电常数的工具。使用FEMLAB软件进行了仿真。在由介电常数(ε)5.5的材料构成的纯10×10方格中(以圆柱体形式),通过用几何上相似但介电常数不同的一根棒代替一根棒,会产生点缺陷材料。缺陷模式的出现取决于折射率对比(定义为缺陷部位材料的折射率(n_d)与晶格材料的折射率(n_1)之比。 (n_d / n_1)在0.85至1.28之间。还对介电常数为10的晶格材料进行了仿真,发现缺陷模式出现在1.18

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