GROWTH OF IRON THIN FILMS BY AP-MOCVD STARTING FROM FERROCENE AND H_2O

摘要

Fe thin layers were obtained by atmospheric pressure MOCVD process starting from the reactive gas mixture FeCp_2 and H_2O in the temperature range 973-1073 K. A thermochemical simulation of the Fe-C-H-O system allowed to approach the optimum processing conditions. XRD and microprobe analysis show that the highest iron content in the layer is obtained for H_2O/FeCp_2 ratios between 4 and 6. Film growth occurs in two steps: the initial formation of a black porous layer which is further densified as a result of the grains growth by increasing the deposition time in order to form grey and compact metallic films. This two steps mechanism is confirmed by kinetic and in situ IR pyrometric observations.