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DFT simulation of the extra Me adatom diffusion on the Ge(111) √3×√3 1/3 ML Me induced surfaces

机译:Ge(111)√3×√31/3 ML Me诱导表面上额外Me原子扩散的DFT模拟

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A first-principle simulation of the surface diffusion of an extra metal (Me) adatom on the corresponding 1/3 monolayer (ML) Ge(111) √3×√3 Me induced surfaces has been performed. Using the Nudged Elastic Band (NEB) optimization method, the minimum energy paths and activation energy barrier profiles for all known Me inducing √3×√3 reconstruction on a Ge(111) surface have been obtained. The value of the activation barrier is shown to depend on the adatom formation energies and the atomic radius of the diffusing metal: 0.33 eV for Pb and 0.25 eV for Sn. The Arrhenius pre-exponential factors that were obtained in the harmonic approximation are as large as 10~(11-12) Hz for all of the investigated surfaces, which supports the single-atomic diffusion model considered here.
机译:第一原理模拟了额外的金属(Me)原子在相应的1/3单层(ML)Ge(111)√3×√3Me诱导的表面上的表面扩散。使用微动弹性带(NEB)优化方法,获得了所有已知的Me在Ge(111)表面上引起√3×√3重构的最小能量路径和活化能垒分布。活化势垒的值显示为取决于原子形成能和扩散金属的原子半径:Pb为0.33 eV,Sn为0.25 eV。谐波近似中获得的Arrhenius预指数因子对于所有研究表面都高达10〜(11-12)Hz,这支持此处考虑的单原子扩散模型。

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