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System for modification of exposure time in fiber Bragg gratings fabrication with using scanning phase mask method

机译:利用扫描相位掩模法修改光纤布拉格光栅中曝光时间的系统

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摘要

In this paper there are described setup for modification of exposure time in fiber Bragg gratings fabrication with using scanning phase mask method. Using this laboratory stage we are able to write uniform, apodized and chirped gratings. Depending on exposure time and grating length it is possible to write gratings with various attenuation for Bragg wavelength. Also, it is possible to change Bragg wavelength, and obtain chirped gratings by linear and gradient postprocessing respectively.
机译:在本文中,描述了使用扫描相位掩模方法修改光纤布拉格光栅中曝光时间的设置。在这个实验室阶段,我们能够编写均匀,切趾和chi光栅。根据曝光时间和光栅长度,可以写出对于布拉格波长具有各种衰减的光栅。而且,可以改变布拉格波长,并分别通过线性和梯度后处理获得chi光栅。

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