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Erbium doped germanium based sulphide optical waveguide amplifier for near and mid-IR

机译:掺do锗的硫化物光波导放大器,用于近红外和中红外

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摘要

Due to remarkable properties of the chalcogenide glasses (Chgs), especially sulphide glasses, amorphous chalcogenide films should play a motivating role in the development of integrated planar optical circuits and their components. This paper describes the fabrication and properties of optical waveguides of undoped and erbium doped sulphide films obtained by RF magnetron sputtering and laser ablation (PLD). The deposition parameters were adjusted to obtain, from sulphide glass targets with a careful control of their purity, layers with appropriate compositional, morphological, structural characteristics and optical properties. A transmission loss of 0.8 dB/cm can be obtained for rib waveguides produced by dry etching under CF_4 plasma (4-300 μm wide, 5.5 μm film thickness. 1.5 μm etched thickness). The photo-luminescence of erbium doped Ge_(20)Ca_5Sb_(10)S_(65) films were clearly observed in the n-IR and mid-IR spectral domain. The study of their decay lifetime with a well adapted annealing treatment controlling the roughness variation reached value of the bulk counterpart. Amplification tests were carried out leading to a complete characterisation of the Erbium doped waveguide. Gain on/off of 4.4 dB (3.4 dB/cm) were achieved for a signal at 1.54 μm in multiple modes sulphide:Er waveguides. The first demonstration of photoluminescence in mid-IR in an Er~(3+) -doped Chg waveguide could potentially be employed to produce sources or amplifiers operating in the mid-IR.
机译:由于硫族化物玻璃(Chgs),特别是硫化物玻璃的卓越性能,非晶硫族化物膜应在集成平面光学电路及其组件的开发中起激励作用。本文介绍了通过射频磁控溅射和激光烧蚀(PLD)获得的未掺杂和掺do硫化物薄膜的光波导的制造和性能。调整沉积参数,以从具有严格控制其纯度的硫化玻璃靶中获得具有适当组成,形态,结构特征和光学性质的层。对于在CF_4等离子体下(4-300μm宽,5.5μm膜厚,1.5μm刻蚀厚度)进行干法刻蚀产生的肋形波导,传输损耗可以达到0.8 dB / cm。掺的Ge_(20)Ca_5Sb_(10)S_(65)薄膜的光致发光在n-IR和中红外光谱域中清晰可见。通过适当控制退火处理以控制粗糙度变化的方法来研究它们的衰变寿命,这可达到体相的值。进行了放大测试,从而完全表征了掺waveguide波导。在多种模式的硫化物:Er波导中,1.54μm处的信号获得4.4 dB(3.4 dB / cm)的开/关增益。 Er_(3+)掺杂的Chg波导中的中红外光致发光的第一个演示可以潜在地用于产生在中红外中工作的源或放大器。

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  • 来源
  • 会议地点 Dresden(DE)
  • 作者单位

    Equipe Verres et Ceramiques, UMR-CNRS 6226;

    CIMAP, UMR 6637, CNRS-CEA-ENS1CAEN, Universite Caen, 14050 Caen, France;

    Faculty of Chemical Technology, University of Pardubice, Pardubice, Czech Republic;

    IETR-Microelcctronique, Universite de Renncs 1, 35042 Rennes, France;

    CCLO and FOTON, UMR 6082-ENSSAT, 6 rue Keranpont, 22305 Lannion. France;

    CIMAP, UMR 6637, CNRS-CEA-ENS1CAEN, Universite Caen, 14050 Caen, France;

    Equipe Verres et Ceramiques, UMR-CNRS 6226;

    Faculty of Chemical Technology, University of Pardubice, Pardubice, Czech Republic;

    Equipe Verres et Ceramiques, UMR-CNRS 6226;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 TB342;
  • 关键词

  • 入库时间 2022-08-26 13:45:06

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