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Preferential Grain Etching of AlMgSi(Zn) Model Alloys

机译:AlMgSi(Zn)模型合金的优选晶粒蚀刻

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摘要

Preferential grain etching, also referred to as "grainy appearance", "galvanizing" or "spangling", is caused by the presence of Zn in the alkaline etching bath. As little as only a few ppm Zn dissolved in the bath is sufficient to produce the effect (1). The problem may occur in production lines where alkaline etching is used prior to anodizing. A common practice to avoid preferential grain etching is to precipitate zinc by adding sulphides or chromates to the etching bath (1).rnKoroleva et al. (2) investigated preferential grain etching of high purity aluminium on neighbouring grains with surface normals <334>, <225> and <119>. Rounding off to the nearest low-index planes, they found that the largest height difference existed between the {001} plane and the deeper {111} plane. The {112} plane was etched to about 1/3 of this distance from the higher {001} plane. They also measured the open circuit potential of the three grains and found an increasingly negative potential with grain depth after
机译:优先的晶粒腐蚀,也被称为“颗粒状外观”,“镀锌”或“飞溅”,是由于碱性腐蚀液中存在锌引起的。溶解在镀液中的锌仅少至几ppm,足以产生效果(1)。在阳极氧化之前使用碱性蚀刻的生产线中可能会出现问题。避免优先进行晶粒腐蚀的一种常见做法是通过向腐蚀液中添加硫化物或铬酸盐来沉淀锌(1)。 (2)研究了在表面法线<334>,<225>和<119>的相邻晶粒上对高纯度铝的优先晶粒腐蚀。四舍五入到最接近的低折射率平面,他们发现最大的高度差存在于{001}平面和更深的{111}平面之间。将{112}平面蚀刻到距较高{001}平面大约此距离的1/3。他们还测量了三个晶粒的开路电势,发现随着晶粒深度的增加,负电势逐渐增加

著录项

  • 来源
    《Oxide films》|2009年|p.71-79|共9页
  • 会议地点 Vienna(AT);Vienna(AT)
  • 作者单位

    SINTEF Materials and Chemistry, NO-0314 Oslo, Norway;

    Department of Materials Science and Engineering, Norwegian University of Science and Technology, NO-7491 Trondheim, Norway;

    Department of Materials Science and Engineering, Norwegian University of Science and Technology, NO-7491 Trondheim, Norway;

    SINTEF Materials and Chemistry, NO-7465 Trondheim, Norway;

    SINTEF Materials and Chemistry, NO-7465 Trondheim, Norway;

    et al;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 TQ050.91;
  • 关键词

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