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Imprinting of Nanoporosity in Lithium-Doped Nickel Oxide through the use of Sacrificial Zinc Oxide Nanotemplates

机译:通过使用牺牲氧化锌纳米模板在锂掺杂的氧化镍中纳米孔的印迹。

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摘要

Methods for simultaneously increasing the conductivity and the porosity of NiO layers grown by pulsed laser deposition (PLD) were investigated in order to develop improved photocathodes for p-DSSC applications. NiO:Li (20at%) layers grown on c-Al_2O_3 by PLD showed a sharp drop in conductivity with increasing substrate temperature. Layers grown at room temperature were more than two orders of magnitude more conductive than undoped NiO layers but did not show evidence of any porosity in Scanning Electron Microscope (SEM) images. A new method for imposing a nanoporosity in NiO was developed based on a sacrificial template of nanostructured ZnO. SEM images and EDX spectroscopy showed that a nanoporous morphology had been imprinted in the NiO overlayer after preferential chemical etching away of the nanostructured ZnO underlayer. Beyond p-DSSC applications, this new process could represent a new paradigm for imprinting porosity in a whole range of materials.
机译:研究了同时增加通过脉冲激光沉积(PLD)生长的NiO层的电导率和孔隙率的方法,以便为p-DSSC应用开发改进的光电阴极。通过PLD在c-Al_2O_3上生长的NiO:Li(20at%)层显示出随着基材温度升高,电导率急剧下降。在室温下生长的层的导电性比未掺杂的NiO层高两个数量级,但在扫描电子显微镜(SEM)图像中没有显示任何孔隙的迹象。基于纳米结构ZnO的牺牲模板,开发了一种在NiO中施加纳米孔隙的新方法。 SEM图像和EDX光谱表明,在优先化学刻蚀掉了纳米结构的ZnO底层之后,纳米孔的形态已经被印在了NiO顶层上。除了p-DSSC应用以外,这种新工艺还可以代表一种在整个材料上印制孔隙度的新范例。

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