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ZD-vacancy related defects in ZnO grown by pulsed laser deposition

机译:脉冲激光沉积生长的ZnO中与ZD空位有关的缺陷

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Undoped and Ga-doped ZnO (002) films were grown c-sapphire using the pulsed laser deposition (PLD) method. Znvacancy related defects in the films were studied by different positron annihilation spectroscopy (PAS). These included Doppler broadening spectroscopy (DBS) employing a continuous monenergetic positron beam, and positron lifetime spectroscopy using a pulsed monoenergetic positron beam attached to an electron linear accelerator. Two kinds of Znvacancy related defects namely a monovacancy and a divacancy were identified in the films. In as-grown undoped samples grown with relatively low oxygen pressure P(O_2)<1.3 Pa, monovacancy is the dominant Zn-vacancy related defect. Annealing these samples at 900 °C induced Zn out-diffusion into the substrate and converted the monovacancy to divacancy. For the undoped samples grown with high P(O_2)=5 Pa irrespective of the annealing temperature and the as-grown degenerate Ga-doped sample (n~10~(20) cm(-3)), divacancy is the dominant Zn-vacancy related defect. The clustering of vacancy will be discussed.
机译:使用脉冲激光沉积(PLD)方法,将无掺杂和Ga掺杂的ZnO(002)薄膜生长为c型蓝宝石。通过不同的正电子an没光谱法(PAS)研究了薄膜中与锌空位有关的缺陷。这些包括采用连续单能正电子束的多普勒增宽光谱(DBS)和使用附接到电子线性加速器上的脉冲单能正电子束的正电子寿命光谱。薄膜中发现了两种与锌空位有关的缺陷,即单空位和双空位。在氧气压力P(O_2)<1.3 Pa相对较低的情况下生长的未掺杂样品中,单空位是与锌空位有关的主要缺陷。将这些样品在900°C下退火会导致Zn向外扩散到基质中,并将单空位转变为双空位。对于高P(O_2)= 5 Pa的未掺杂样品,无论退火温度如何,以及刚生长的简并Ga掺杂样品(n〜10〜(20)cm(-3))而言,空位是主要的Zn-空缺相关的缺陷。将讨论空缺的聚类。

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