Optical characterization of photopolymer and photoresist materials for storage, sensing and security applications

摘要

Diffractive optical elements with application specific tailored properties can be fabricated by light induced alternation of the material's refractive index. Holographic polymers or photoresists are typically used for permanent optical structurization. Today, photostructurable media become core elements of photonic systems with innovative capabilities. We investigate different classes of organic photosensitive materials in order to optimize the interaction between the material and an optoelectronic system around. Some exemplary applications are microholographic data storage, 3D nano/micro structurization, optical patterning for advanced security features. Key issues include dynamic material response, spectral and temporal grating development, influence of the light intensity distribution, effects of pre-exposure and post-curing, etc. Materials under investigation are cationic and free radical polymerization systems, liquid crystalline polymer nanocomposites, and photoresist systems.