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Silicon Cladding of Mirror Substrates

机译:镜面基板的硅覆层

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To reduce the finishing costs of silicon carbide mirror substrates, silicon claddings are applied allowing the surfaces to be more easily diamond turned and polished than the bare chemical vapor deposited (CVD) silicon carbide or bimodal reaction bonded SiC (RB-SiC). The benefits of using silicon as the optical face will be reviewed as will the process for applying plasma enhanced chemical vapor (PE-CVD) deposited amorphous silicon cladding on substrates. Using one mirror as an example, the successful finishing results will be shared.
机译:为了减少碳化硅镜面基板的修整成本,与裸露的化学气相沉积(CVD)碳化硅或双峰反应结合SiC(RB-SiC)相比,应用了硅包层可以使表面更容易进行金刚石车削和抛光。将回顾使用硅作为光学面的好处,以及将等离子增强化学气相沉积(PE-CVD)沉积在基板上的非晶硅覆层的工艺。以一面镜子为例,将分享成功的整理结果。

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