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Atomistic Simulations of Dislocation-Interface Interactions in Thin Films

机译:薄膜中位错-界面相互作用的原子模拟

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Atomistic simulations are carried out to study the effect of atomic sliding capability at the interface between a plastically deforming film and a stiff substrate. Molecular statics modeling is utilized to corroborate the overall film response and the nano-scale defect mechanisms. A free-sliding interface is shown to be able to cause "reflection" of oncoming dislocations and enhance film plasticity. A rigidly bonded interface, on the other hand, is seen to resist approaching dislocations. Partial sliding results in a transitional behavior between the two extremes, as revealed in our parametric analysis. The sliding capability of interface atoms is also seen to dictate the overall film response.
机译:进行了原子模拟,以研究原子变形能力在塑性变形膜和刚性基底之间的界面上的影响。利用分子静力学建模来证实整个薄膜响应和纳米级缺陷机理。示出了自由滑动的界面能够引起即将到来的位错的“反射”并增强膜的可塑性。另一方面,刚性结合的界面可以抵抗接近的位错。如我们的参数分析所示,部分滑动会导致两个极端之间的过渡行为。还可以看到界面原子的滑动能力决定了整个薄膜的响应。

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