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Effect of Ionizing Radiation on the Properties of Superhydrophobic Silicone Surfaces

机译:电离辐射对超疏水有机硅表面性能的影响

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Superhydrophobic surfaces may be useful for a variety of optical applications as these surfaces exhibit high contact angles with water (>150°) and low-drag. These properties prevent the accumulation of water droplets on the optical surface that would otherwise occur due to condensation or the adhesion of droplets from precipitation. Challenges to producing robust superhydrophobic surfaces for optical applications include the development of cost-effective processes that are compatible with non-planar optical substrates as well as the identification of material systems that exhibit long-term reliability.rnWe have developed a 3D printing technology to create superhydrophobic surfaces by dispensing arrays of high aspect ratio polymeric features onto optical substrates. In this paper, superhydrophobic surfaces were prepared by dispensing silicone elastomers into arrays of features on glass substrates. These samples were exposed to either Cobalt 60 gamma-rays or 63.8 MeV protons to simulate ionization-induced total dose environments that could be experienced in some space orbits. In addition exposure to other harsh environments, including salt water and 125°C temperatures were evaluated. The effects of these exposure conditions on superhydrophobic properties, as measured by slip angles, are reported. Near-term potential space applications will be discussed.
机译:超疏水表面可用于多种光学应用,因为这些表面与水的接触角高(> 150°),阻力低。这些特性可防止水滴在光学表面上的积聚,否则水滴会由于凝结或水滴的附着而发生沉淀。生产用于光学应用的坚固的超疏水表面所面临的挑战包括开发与非平面光学基材兼容的具有成本效益的工艺,以及识别具有长期可靠性的材料系统。rn我们已经开发了3D打印技术来创造通过将高纵横比聚合物特征的阵列分配到光学基材上,形成超疏水表面。在本文中,通过将有机硅弹性体分配到玻璃基板上的特征阵列中来制备超疏水表面。这些样品暴露于钴60伽玛射线或63.8 MeV质子下,以模拟在某些空间轨道上可能发生的电离诱导的总剂量环境。此外,还评估了暴露于其他恶劣环境(包括盐水和125°C温度)的可能性。据报道这些暴露条件对超疏水性能的影响,如通过滑移角测量的。将讨论近期潜在的空间应用。

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