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Photochemical Alteration of the Stability of Polymer Nano-Agglomerates

机译:聚合物纳米团聚物稳定性的光化学变化

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摘要

In this work the mechanical stability of nanoscale polystyrene (PS) agglomerates was examined by experimental determination of the fragmentation energy by impact fragmentation. The potential of Aerosol-Photochemistry was investigated to alter agglomerate stability. Spherical particles of PS were generated by nebulization of a PS-CCl_4 solution. The surface modification of the particles was performed in a continuous vacuum ultraviolet (VUV) reactor before agglomeration of the primary particles was allowed. The radical chemical reactions induced by VUV radiation that occurred on the particle surface were dependent on the carrier gas composition and dose of irradiation. Thus, the interparticle forces could be enhanced by increasing the number of carboxyl groups (hydrogen bridge linkage, condensation reaction) on the particle surface and weakened by introducing chlorine groups (repulsive interaction).
机译:在这项工作中,通过实验确定冲击碎裂产生的碎裂能量,从而检查了纳米级聚苯乙烯(PS)附聚物的机械稳定性。研究了气溶胶光化学改变附聚物稳定性的潜力。 PS的球形颗粒是通过雾化PS-CCl_4溶液生成的。在允许初级颗粒附聚之前,在连续真空紫外(VUV)反应器中进行颗粒的表面改性。由VUV辐射引起的发生在颗粒表面的自由基化学反应取决于载气的组成和辐照剂量。因此,可以通过增加颗粒表面上的羧基数目(氢桥键,缩合反应)来增强颗粒间力,而通过引入氯基团(排斥相互作用)来减弱颗粒间力。

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