首页> 外文会议>Multilayer and Grazing Incidence X-Ray/EUV Optics >Reflectivity measurements of Ni/V Ni/Ti and W/C multilayer mirrors in the 2-6nm wavelength region using synchrotron radiation
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Reflectivity measurements of Ni/V Ni/Ti and W/C multilayer mirrors in the 2-6nm wavelength region using synchrotron radiation

机译:使用同步加速器辐射在2-6nm波长范围内测量Ni / V Ni / Ti和W / C多层反射镜的反射率

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Abstract: Recent progress in the fields of physical vapor deposition (PVD), coupled with increased interest in the soft x-ray region of the electromagnetic spectrum, has driven the development of layered synthetic microstructures (LSMs) to the point that useful nongrazing incidence optics based on this technology are used in a variety of applications (e.g., solar astronomy, soft x-ray microscopy, and plasma spectroscopy). Our goal, as a production facility for thin film devices, was to demonstrate the capability for surement at 0.154 nm (CuK$alpha@). !17
机译:摘要:物理气相沉积(PVD)领域的最新进展,再加上人们对电磁波谱的软X射线区域越来越感兴趣,从而推动了层状合成微结构(LSM)的发展,以至于有用的非掠入射光学系统基于该技术的技术可用于多种应用(例如,太阳天文学,软X射线显微镜和等离子光谱)。作为薄膜设备的生产基地,我们的目标是证明在0.154 nm(CuK $ alpha @)上的测量能力。 !17

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