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UV Laser Ablation of PLZT and PSZT Films

机译:PLZT和PSZT膜的紫外激光烧蚀

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The ablation of strontium-doped lead zirconate titanate (PSZT) and lanthanum-doped lead zirconate titanate (PLZT) films has been examined using a 5 ns pulsed excimer laser. Individual squares were patterned with sides in the range of 10-30 μm using single and multiple pulses. The depth of ablation in PLZT films was higher at all fluences than in PSZT films. The morphology of the etched surfaces has comprised the formation of globules which had diameters of 200-250 nm in PLZT and 1400-1600 nm in PSZT films. The diameter of the globules has been shown to increase with fluence until reaching an approximately constant size at ≥20 J/cm~2 in both types of film. The composition of the films following ablation has been analyzed using x-ray photoelectron spectroscopy (XPS) and energy dispersive x-ray (EDX) spectroscopy.
机译:已经使用5 ns脉冲准分子激光检查了掺锶锶钛酸铅钛酸酯(PSZT)和掺镧镧锆钛酸铅(PLZT)薄膜的烧蚀。使用单个和多个脉冲将单个正方形的侧面图案化为10-30μm。在所有注量下,PLZT膜的烧蚀深度均高于PSZT膜。蚀刻表面的形态包括形成小球,在PLZT中直径为200-250nm,在PSZT膜中直径为1400-1600nm。已经显示,在两种类型的膜中,小球的直径随着通量的增加而增大,直到达到≥20 J / cm〜2的近似恒定尺寸为止。使用X射线光电子能谱(XPS)和能量色散X射线(EDX)能谱分析了烧蚀后的膜组成。

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