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Diagram method for resolution limit calculation in laser microscopy

机译:激光显微镜中分辨率极限计算的图解法

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In this work, we study the influence of optical process on the resolution limit of laser microscopy. We formulate the calculation rules of the resolution limits for all types of laser microscopy that employ a variety of optical processes occurring in a sample. By replacing the field with the creation/annihilation operators, we develop a theoretical framework to unify the image-forming formulas that cover all interactions between molecules in the sample and the excitation light including vacuum field. To determine the simple rules for the evaluation of optical resolution, our theoretical framework provides the diagram method that describes linear, nonlinear, coherent, and incoherent optical processes. According to our formulas, the type of optical process decisively influences the resolution limit if no a priori information on the sample exists.
机译:在这项工作中,我们研究了光学工艺对激光显微镜分辨率极限的影响。我们为使用样本中发生的各种光学过程的所有类型的激光显微镜制定了分辨率极限的计算规则。通过用创建/ an灭运算符替换该字段,我们开发了一个理论框架来统一成像公式,该公式涵盖了样品中的分子与激发光(包括真空场)之间的所有相互作用。为了确定评估光学分辨率的简单规则,我们的理论框架提供了描述线性,非线性,相干和非相干光学过程的图解方法。根据我们的公式,如果样品上不存在先验信息,光学处理的类型将决定性地影响分辨率极限。

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