首页> 外文会议>MISM2008;Moscow international symposium on magnetism; 20080620-25;20080620-25; Moscow(RU);Moscow(RU) >CONFINED-QHALCOGENIDE PHASE CHANGE MEMORY WITH THIN METAL INTERLAYER FOR LOW RESET CURRENT BY FINITE ELEMENT MODELING
【24h】

CONFINED-QHALCOGENIDE PHASE CHANGE MEMORY WITH THIN METAL INTERLAYER FOR LOW RESET CURRENT BY FINITE ELEMENT MODELING

机译:有限元建模的低复位电流下薄金属夹杂的有限质子化物相变记忆

获取原文
获取原文并翻译 | 示例

摘要

This paper reports on the confined-chalcogenide phase change memory with thin metal interlayer (CCTMI) with the operating reset current of 0.6mA-30ns. This cell offers low reset current with simple architecture and fabrication. Thermal and heat flux distribution of both the normal-bottom-contact (NBC) and a proposed CCTMI PCM cells were carefully analyzed and simulated by two-dimensional finite element modeling. It is intriguingly found that the reset operation current of the CCTMI cell is 44% lower than that of the NBC. CCTMI has capability to solve an over-programming fail issue due to confined heat dissipation in active area.
机译:本文报道了具有薄金属夹层(CCTMI)的受限硫族化物相变存储器,其工作复位电流为0.6mA-30ns。该单元以简单的结构和制造提供低复位电流。通过二维有限元建模,对正常底部接触(NBC)和建议的CCTMI PCM单元的热和热通量分布进行了仔细的分析和模拟。有趣地发现,CCTMI单元的复位操作电流比NBC低44%。 CCTMI有能力解决由于活动区域内的有限散热而导致的过度编程失败问题。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号