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Climb/glide dislocation sources at low misfit Ge_xSi(001) interfaces

机译:低失配Ge_xSi(001)界面处的爬升/滑移位错源

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Detailed analysis of Burgers vectors and line directions has been carried out on the "double half loops",formed during growth,and other small loops,formed during growth and on annealing,observed by Perovic and Houghton (1992) in low misfit Ge_xSi_1-x / (001) Si heterostructures.Both defect types originate from small vacancy loops,near the interface,the former visibly associated with precipitates > 10 nm in size; both have to transform into glissile configurations by stress driven vacancy absorption and glide before generating misfit dislocations.This corresponds to the nucleation stage for misfit dislocation generation (Houghton 1991).
机译:对Perburg和Houghton(1992)在低失配Ge_xSi_1-x中观察到的Burgers向量和线方向的详细分析已在生长过程中形成的“双半环”以及生长过程中和退火过程中形成的其他小环中。 /(001)Si异质结构。两种缺陷类型均源自界面附近的小空环,前者明显与尺寸大于10 nm的析出物有关;在产生失配位错之前,两者都必须通过应力驱动的空位吸收和滑移而转变为易弯曲的构型,这与产生失配位错的成核阶段相对应(Houghton 1991)。

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