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Nanoscale optimization of quantum dot media for effective photovoltaic conversion

机译:量子点介质的纳米级优化,可实现有效的光伏转化

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Nanoscale engineering of band profile and potential profile provide effective tools for the management of photoelectron processes in quantum dot (QD) photovoltaic devices. We investigate the QD devices with various 1-μm InAs /GaAs QD media placed in a 3-μm base GaAs p-n junction. We found that n-charging of quantum dots (QDs) create potential barriers around QDs. QD growth between ultrathin AlGaAs layers leads to the formation of AlGaAs "fence" barriers, and reduces the wetting layers (WLs). The barriers around QDs and reduction of the wetting layer substantially suppress recombination processes via QDs. The n-doping of interdot space in QD media enhances electron extraction from QDs. All of our QD devices show short-circuit current, J_(SC), higher than that of the reference cell, but smaller open-circuit voltage, V_(OC).. In the QD devices, the short circuit currents increase by ~0.1 mA/cm~2 per dot layer. J_(SC) reaches 28.4 mA/cm~2 in the device with QD media that combines dot charging, fence barriers, and WL reduction.
机译:能谱和势能谱的纳米级工程为量子点(QD)光伏器件中的光电子过程管理提供了有效的工具。我们研究了将各种1-μmInAs / GaAs QD介质放置在3-μm基本GaAs p-n结中的QD器件。我们发现,量子点(QD)的n充电会在QD周围形成潜在的势垒。超薄AlGaAs层之间的QD生长导致AlGaAs“栅栏”势垒的形成,并减少了润湿层(WLs)。 QD周围的势垒和润湿层的减少基本抑制了经由QD的重组过程。 QD介质中点间距的n掺杂增强了QD的电子提取。我们所有QD器件的短路电流J_(SC)均高于参考电池,但开路电压V_(OC)较小。在QD器件中,短路电流增加〜0.1每个点层mA / cm〜2。在具有QD介质的设备中,J_(SC)达到28.4 mA / cm〜2,该介质结合了点电荷,栅栏势垒和WL减小。

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