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HIGH-TEMPERATURE OXIDATION KINETICS OF ADDITIVELY MANUFACTURED NITIHF

机译:高温氧化动力学加瘦性的nitihf

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NiTi-based high-temperature shape memory alloys (HTSMAs) such as NiTiHf have been utilized in a broad range of applications due to their high strength and work output, as well as, their ability to increase the transformation temperatures (TTs). Recently, additive manufacturing techniques (AM) have been widely used to fabricate complex shape memory alloy components without anv major modifications or tooling and has paved the way to tailor the manufacturing and fabrications of microstructure and critical properties of their final parts. NiTi alloys properties such as transformation temperatures can be significantly altered due to oxidation, which can occur during the manufacturing process or post-processing. In this work, the oxidation behavior of Si-rich NiTi20Hf shape memory alloys, which was fabricated by the selective laser melting (SLM) method, is evaluated. Thertnogravimetric analysis (TGA) is used to assess the kinetic behavior of the oxidation at different temperature ranges of 500, 700, and 900°C for 20 hours in the air. After oxidation, to evaluate the microstructure and chemical composition X-ray diffraction (XRD), scanning electron microscopy (SEM), and energy-dispersive X-ray spectroscopy (EDS) was conducted. The isothermal oxidation kinetics of conventional NiTi20Hf alloys were studied, and the results were compared to AM samples. Results show a two-stage oxidation rate at which oxidation increased with the high rate at the initial stage. As the oxidation time increased, the oxidation rate gradually decreased. The oxidation behavior of NiTiHf alloys initially obeyed logarithmic rate law and then followed by parabolic rate law. SEM results showed the formation of a multi-layered oxide scale, including TiO_2, NiTiO_3, and Hf oxide.
机译:基于NITI的高温形状记忆合金(HTSMA),如NITIHF,由于其高强度和工作输出,以及它们增加变换温度(TTS)的能力,因此在广泛的应用中使用了广泛的应用。最近,添加剂制造技术(AM)已被广泛用于制造复杂的形状记忆合金组件而没有ANV的主要修改或工具,并且已经铺平了定制的制造和制造和其最终部件的关键性质的方式。 NITI合金诸如转化温度的性质可以由于氧化而显着改变,这在制造过程中可能发生或后处理。在这项工作中,评价通过选择性激光熔化(SLM)方法制造的Si的Niti2HF形状记忆合金的氧化行为。 Thertnogravimetric分析(TGA)用于评估在空气中不同温度范围为500,700和900℃的氧化的动力学行为。氧化后,进行微观结构和化学组合物X射线衍射(XRD),进行扫描电子显微镜(SEM)和能量分散X射线光谱(EDS)。研究了常规NITI20HF合金的等温氧化动力学,并将结果与​​AM样品进行比较。结果表明,氧化在初始阶段的高速率高的两级氧化速率。随着氧化时间增加,氧化速率逐渐降低。 NITIHF合金最初服从对数率法的氧化行为,然后用抛物率法进行。 SEM结果表明,多层氧化物尺度的形成,包括TiO_2,NitiO_3和HF氧化物。

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