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A Novel Double-Density Hemi-Cylindrical (HC) Structure to Produce More than Double Memory Density Enhancement for 3D NAND Flash

机译:一种新型双密度半圆柱(HC)结构,为3D NAND闪光产生多于双内存密度增强

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A novel hemi-cylindrical (HC) 3D NAND Flash architecture is demonstrated for the first time. HC 3D NAND squeezes the gate-all-around (GAA) hole in one direction, followed by a slit cut to split the GAA device to produce twin cells. It creates ~ 2.6 times of memory density increase than standard GAA 3D NAND at the same stacking layer. Both experimental and simulation results clarify that the "non-local" effect of channel potential can essentially "smooth" the non-uniform curvature effect thus the HC 3D NAND device possesses regular P/E window characteristics even it is not a regular shape of GAA. Good 100K PE cycling endurance and post 10K-cycled 150C retention are demonstrated. HC 3D NAND structure has potential to further scale 3D NAND device in lateral dimension, with the advances of processing technologies.
机译:首次对新颖的半圆柱(HC)3D NAND闪存架构进行了演示。 HC 3D NAND在一个方向上挤压门 - 全方位(GAA)孔,然后是狭缝切割以分开GAA器件以产生双细胞。它在相同的堆叠层中创造了比标准GAA 3D NAND的内存密度增加〜2.6倍。实验和仿真结果阐明了通道电位的“非本地”效果可以基本上“平滑”不均匀的曲率效果,因此HC 3D NAND器件具有常规的P / E窗口特性,即使它不是GAA的正常形状。良好的100K PE循环耐力和柱10K循环的150℃保持术。 HC 3D NAND结构具有进一步在横向尺寸的尺寸缩放3D NAND器件的潜力,具有加工技术的进步。

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