VIPER: A Versatile and Intuitive Pattern GenERator for Early Design Space Exploration

摘要

Contemporary technology nodes exhibit high defectivity due to complex interactions between the process and certain layout topologies/patterns. Foundries identify such patterns during diagnosis, Scanning Electron Microscope (SEM) inspections, Failure Analysis (FA), etc., and create a database to restrict their presence in future designs. However, such a database can be generated only after fabricating a few products, hence making this process reactive. Ideally, foundries would prefer to have a proactive approach, where such sensitive patterns are available up-front during technology development. Thereby, they can build accurate Hotspot Detection models and offer a robust Product Design Kit (PDK) to even the earliest of customers, either by ensuring that the process is immune to such patterns or by including them in the Design For Manufacturability Guidelines (DFMGs). To enable this, Early Design Space Exploration (EDSE) can be performed, wherein an Electronic Design Automation (EDA) tool generates synthetic layout patterns. In this work, we introduce VIPER, a novel, controlled random walk-based pattern generation method, which not only generates realistic and Design Rule-clean layout patterns, but which also offers versatility so that the generated patterns can be intuitively customized to specific needs. To ensure that the generated patterns are representative of real designs, we data mine designs in previous technology nodes and we learn some of their typical characteristics. Effectiveness of the proposed method is contrasted against the state-of-the-art, commercially available EDA tool.