PPMgLN ridge waveguide fabrication with low optical scattering loss using dry-etch process

摘要

We fabricated QPM-SHG (quasi-Phase-Matched Second-Harmonic-Generation) ridge type waveguide using PPMgLN Dry-etch Fabricaion process. We measured sidewall Roughness of ridge waveguide using AFM. We calculated optical scattering Loss with sidewall roughness RMS and Ridge Waveguide structure inspection result. As a result of calculated loss, sidewall scattering roughness little contributes to the propagation loss. By using optimized period and NLD dry-etch Process, high conversion efficiency can be obtained by using a SHG device at room temperature.