A kinetic one-dimensional spherically symmetric model of heating of metal microdroplet (with radius 1–2 micrometers) by surrounding plasma was developed. The kinetic model is a model of 1D3V PIC/DSMC type. The model describes the thermo-field electron emission and evaporation from the droplet surface as well as correspondent plasma creation. Thus the droplet heating is modeled selfconsistently, taking into account the influence of the plasma generated during the process. The calculations have shown, that beginning from the certain surface temperature the droplet heated mostly by electron flux from the plasma. A certain kind of thermal instability takes place in the developed model. Beginning from the certain value, the droplet surface temperature grows exponentially and reaches the critical temperature, after that the calculation is stopped because of model restrictions.
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