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MaskVer: A Tool Helping Designers Detect Flawed Masking Implementations

机译:Maskver:帮助设计人员检测有缺陷的遮蔽实现的工具

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Hardening cryptographic algorithms against side-channel attacks is a complex but crucial task in today's hardware implementations. One of the most promising counter measures is Boolean Masking. Designers spend much effort to optimise and customise their masking schemes, but many proposed masked implementations were eventually broken, because they are somehow flawed - not necessarily restricted to a specific error, but to an overall leakage problem. As today's EDA tools hardly support masking, the masking process is still a manual task for the designer. Even worse, due to the lack of capable EDA tools, after synthesis there is no guarantee that the masking still applies and is not optimised. Checking each and every gate of a netlist for masking flaws after synthesis is a time consuming, expensive, and infeasible task. In this paper, we propose a graph based method to reduce the number of gates to be checked. We also present a prototype implementation of our tool to help designers detecting flawed masking in their designs.
机译:在当今的硬件实现中,硬化密加密算法反对侧通道攻击是一个复杂但重要的任务。最有前途的柜台措施之一是布尔掩蔽。设计师花费很多努力优化和定制他们的掩蔽方案,但许多提议的掩蔽实现最终被破坏了,因为它们是某种缺陷的 - 不一定限于特定的错误,而是整体泄漏问题。由于今天的EDA工具几乎不支持屏蔽,掩蔽过程仍然是设计者的手动任务。更糟糕的是,由于缺乏有能力的EDA工具,合成后,无法保证掩蔽仍然适用并且未进行优化。在合成之后检查用于掩蔽缺陷的网表的每个栅极是耗时,昂贵和不可行的任务。在本文中,我们提出了一种基于曲线图的方法,以减少要检查的门的数量。我们还提供了我们工具的原型实施,以帮助设计人员在其设计中检测到缺陷的屏蔽。

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