首页> 外文会议>International Conference on Electrical Electronic Engineering >Dependency of the band gap of electrodeposited Copper oxide thin films on the concentration of copper sulfate (CuSO4.5H2O) and pH in bath solution for photovoltaic applications
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Dependency of the band gap of electrodeposited Copper oxide thin films on the concentration of copper sulfate (CuSO4.5H2O) and pH in bath solution for photovoltaic applications

机译:电沉积铜氧化铜薄膜带隙对硫酸铜浓度(CuSO4.5H2O)和PH值的光伏应用浓度

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In this study, Copper oxide thin films were deposited on copper plate by electrodeposition process in an electrolytic bath containing CuSO.5HO, 3M lactic acid and NaOH. Copper oxide films were electrodeposited at different pH and different concentration of CuSO.5HO and the optical band gap was determined from their absorption spectrum which was obtained from UV-Vis absorption spectroscopy. It was found that copper oxide films which were deposited at low concentration of CuSO.5HO have higher band gap than those deposited at higher bath concentration. The band gap of copper oxide films also significantly changes with pH of the bath solution. It was also observed that with the increase of the pH of bath solution band gap of copper oxide film decreased.
机译:在该研究中,通过电解浴中含有Cuso.5HO,3M乳酸和NaOH的电解浴中的电解浴沉积氧化铜薄膜在铜板上沉积在铜板上。在不同的pH下电沉积氧化铜膜,并且不同浓度​​的CusO.5HO和光带间隙由其吸收光谱法从UV-Vis吸收光谱获得。发现以低浓度的CusO.5HO沉积的氧化铜膜具有比在较高浴浓度下沉积的带隙的带隙。氧化铜膜的带隙也随着浴溶液的pH显着变化。还观察到,随着氧化铜膜的浴溶液带隙的pH值下降。

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