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Gen3 Embedded Cooling for High Power RF Components

机译:Gen3嵌入式冷却为高功率RF组件

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Near-junction thermal barriers severely limit the inherent capability of high-quality wide bandgap materials and architectures and necessitate the development of an alternative, Gen3, thermal management paradigm to reach the goals of future high-power RF applications. Recent Gen3 "embedded cooling" efforts in the aerospace industry have focused on reduction of this near-junction thermal resistance, through the use of diamond substrates and efficient removal of the dissipated power with on-chip convective and jet impingement microfluidics. The options, challenges, and techniques associated with the development of embedded thermal management technology are described, with emphasis on the accomplishments and status of efforts related to GaN power amplifiers.
机译:近交界处的热障碍严重限制了高质量宽带隙材料和架构的固有能力,并需要开发替代,Gen3,热管理范例,以实现未来的高功率RF应用的目标。最近的Gen3“嵌入式冷却”在航空航天工业中的努力集中于通过使用金刚石基板和有效地去除随着片上的对流和喷射冲击微流体的耗散功率的近交联的热阻。描述了与嵌入式热管理技术的发展相关的选项,挑战和技术,重点是与GaN功率放大器相关的成就和地位。

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