The PMJ1025 Panel Discussion set a goal to identify at the end of the discussion a single winner standing at center of the stage. But it turned out it was not so easy as either path you choose, 193i or EUV, there are big challenges in both directions. To summarize, EUV development is gaining momentum and to borrow words from Frank, "It's a question of when rather than if. One fact is also clear that it becomes exponentially harder to print patterns with 193i with each node of scaling. Time will come for sure when EUV is the clear winner standing at center of the stage, but as for N7 high volume production in 2018, we could not pick out a clear winner.
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