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High-speed and Ultra-low Power IoT One-chip (MCU + Connectivity-chip) on a Robust 28-nm Embedded Flash Process

机译:高速和超低功耗IOT单片机(MCU + Connectivity-Chip)在强大的28-NM嵌入式闪存过程中

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Based on robust 28-nm embedded flash (eFlash) process, IoT One-chip for high-speed and low power applications which MCU-chip (10Mb eFlash) and connectivity-chip (BLE/Zigbee) are integrated for the first time. By introducing new devices on 28-nm low-power eFlash process, high-speed ( random read), ultra-low power sleep mode current, 10/13mA RF current at Tx/Rx mode) and robust reliability (-40 ~ 125°C stable operation, 100K cycle endurance, 150C/RT retention up to 200K hours) are achieved. LDD-first IO transistor with low Vth (~0.5V) for low-Vdd (~1.0V) operation [1] and ultra-low leakage (ULL) SRAM bit-cell (0.1x vs. normal) supporting low sleep mode chip current are applied to extend battery life-time. Stable endurance and high (/low)-temperature retention after cycling stress are achieved by robust split-gate type eFlash cell.
机译:基于强大的28-NM嵌入式闪光灯(EFLASH)过程,IOT一体化用于高速和低功耗应用的MCU - 芯片(10MB EFLASH)和连接芯片(BLE / ZigBee)首次集成。通过在28-NM低功耗EFLASH过程中引入新设备,高速(随机读数),超低功耗睡眠模式电流,10 / 13mA RF电流在TX / RX模式下)和鲁棒的可靠性(-40〜125° C稳定运行,实现100K循环耐久性,150℃/ RT保留高达200k小时)。 LDD-First IO晶体管,低VDD(〜0.5V)的低VDD(〜0.5V)操作[1]和超低泄漏(ULL)SRAM位 - 单元(0.1x与正常)支持低睡眠模式芯片应用电流以延长电池寿命。通过稳健的分裂栅极型EFLASH细胞实现循环应力后的稳定耐久性和高(/低)的温度保持。

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