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Treatment of halogenated hydrocarbons from the wastewater of vinylidene chloride synthesis using H2O2/UV technology

机译:H2O2 / UV技术处理偏二氯乙烯合成废水的卤代烃

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The wastewater from vinylidene chloride (VDC) synthesis contains high concentration of sodium chloride and halogenated hydrocarbons which are all volatile organic chemicals (VOCs). Based on the wastewater characteristics, an air-stripping process was applied for pretreatment to remove most of the halogenated hydrocarbons in the wastewater, and then the H2O2/UV advanced oxidation process (AOP) was used for polishing treatment so that the treated wastewater could be reused for making chlorine and sodium hydroxide through electrolyzing. And the polishing testing results of the air-stripping unit's effluent were reported in this paper. The experimental results showed that halogenated hydrocarbons almost could not be degraded if H2O2 was used alone, and limited efficiency was observed when UV used alone, but when the H2O2 was used with UV together, their oxidation efficiency was significantly improved, this indicated that cooperative effect happened when H2O2 and UV were used simultaneously. The degradation rate of halogenated hydrocarbons was increased with H2O2 concentration increasing, but when H2O2 concentration was up to 15mmol/L, the degradation rate of halogenated hydrocarbons almost didn't increase with H2O2 concentration increasing again. The residual concentration of halogenated hydrocarbons was decreased linearly with UV radiation time prolongation at a given H2O2 dosage; this indicated that the reaction kinetics belonged to pseudo-zero-order formulation. Additionally, the experimental result also showed that the high concentration sodium chloride in wastewater had a negative effect on H2O2/UV oxidation process.
机译:来自偏二氯乙烯(VDC)合成的废水含有高浓度的氯化钠和卤化烃,这些卤化烃是所有挥发性有机化学品(VOC)。基于废水特性,施用空气汽提工艺进行预处理以除去废水中的大部分卤代烃,然后使用H2O2 / UV高级氧化方法(AOP)进行抛光处理,以便处理过处理的废水通过电解重复用氯和氢氧化钠。本文报道了抛光单元的流出物的抛光测试结果。实验结果表明,如果单独使用H 2 O 2,则卤化烃几乎不能降解,并且当单独使用的UV使用时观察到有限的效率,但是当H2O2一起使用uV时,它们的氧化效率显着改善,这表明合作效应发生在同时使用H2O2和UV时发生。随着H 2 O 2浓度的增加,卤代烃的降解速率增加,但是当H 2 O 2浓度高达15mmol / L时,卤代烃的降解速率几乎没有增加H2O2浓度再次增加。在给定的H 2 O 2剂量下,卤化烃的残余浓度随紫外线辐射时间延长而导致的含量下降;这表明反应动力学属于伪零阶制剂。另外,实验结果还表明废水中的高浓度氯化钠对H 2 O 2 / UV氧化过程具有负面影响。

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