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IN SITU HREM OF GE GROWTH IN AL MATRIX

机译:基质中GE的原位生长

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The crystallization of Al:Ge amorphous thin films was studied intensively and various aspects were reported elsewhere. The crystallized area consists of a compact Al crystal in which a branched crystalline Ge is formed. Both, the Al crystal and the tips of the Ge branches grow at constant velocity at a given temperature. The velocity of the coupled interfaces is slow enough (few A/sec) enabling to study in sub-nano meter scale the evolution of both interfaces: the interface of crystalline Al in the amorphous Al:Ge matrix, as well as the interface of the crystalline Ge in the Al matrix. The dynamic of both interfaces was by in situ electron microscopy methods using heating holders and CCD video camera. These methods include Time Resolved Conventional Transmission Electron Microscopy (Dark and Bright fields), Time Resolved High Resolution Electron Microscopy (HREM) and Time Resolved Chemical Composition using Gatan Image Filter (GIF).
机译:对Al:Ge非晶薄膜的结晶进行了深入研究,并在其他地方报道了各个方面。结晶区域由致密的Al晶体组成,其中形成了分支晶体Ge。在给定温度下,Al晶体和Ge分支的尖端均以恒定速度生长。耦合界面的速度足够慢(几安培/秒),从而能够在亚纳米级上研究两个界面的演化:非晶Al:Ge基质中结晶Al的​​界面,以及非晶Al:Ge基质中的Al界面。 Al基体中的结晶Ge。这两个界面的动态都是通过使用加热座和CCD摄像机的原位电子显微镜方法进行的。这些方法包括时间分辨的常规透射电子显微镜(暗场和明场),时间分辨的高分辨率电子显微镜(HREM)和使用Gatan图像滤镜(GIF)的时间分辨的化学成分。

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