The influence of shadow mask technique in sulfur hexafluoride plasma on PES surface wettability

摘要

High hydrophilic/hydrophobic contrast surfaces on polyethersulfone (PES) samples were formed by shadow mask technique in electron cyclotron resonance generated sulfur hexafluoride plasma atmosphere. The plasma-treated polymer film surface properties are characterized using contact angle measurement. The contact angle measurements clearly indicate that the unmasked areas on the polymer surfaces were hydrophobic with a large water contact angle and therefore decreased the surface wettability. The masked areas on the polymer surfaces increased surface wettability. In addition, the surface wetting property of the masked areas was found to change significantly with the plasma treatment time, the mask-to-substrate distance and the storage time after the treatment. The best water contact angle contrast obtained from the treated surfaces was larger than 100 degrees.