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Ranges and range fluctuations of Cu_N nanoclusters implanted in Cu(111): a molecular dynamics study

机译:Cu(111)中植入Cu_n纳米能量的范围和范围波动:分子动力学研究

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In recent years, the interaction of accelerated nanoclusters with surfaces has received increasing interest due to various existing or still anticipated practical applications of cluster beams. One of the fundamental questions is how the nonlinear spike effects (which normally happen during cluster implantation) can affect stopping power and, hence the range (penetration depth) of cluster atoms? In fact, there are two contradictory points of view. On one hand, some theoretical and experimental studies indicate significant enhancement of ranges of implanted cluster atoms with respect to implanted single-atomic ions at the same velocity (so-called "clearing-the-way effect" first described by P. Sigmund and V. Shulga). On the other hand, recent experiments of H.H. Andersen have shown that mean range of atoms of metallic clusters in copper with energy of 10 keV/atom is independent on cluster size, whereas significant enhancement of broadening of implantation profile takes place with increase of cluster size (so-called "within spike diffusion" effect). To extend these studies, in present work we carry out systematic computations of projected range distribution of atoms of Cu_N clusters (N=1, 6, 13, 55) implanted into Cu(111) at various energies per one incident atom - within (100...1000) eV/atom. Simulation was done by means of classical Molecular Dynamics (MD) method. It was demonstrated that both mean projected range and range straggling (broadening) of cluster atoms exceeds those of monomer at the same velocity. At the same time, the effect of range enhancement with increase of cluster size is found to be disappeared with growth of energy per one incident atom. On the other hand, the effect of strong enhancement of range straggling with increase of cluster size is not so much energy-dependent. The possible mechanisms responsible on these effects are discussed.
机译:近年来,由于各种现有或仍然预期的集群束的实际应用,加速纳米能器与表面的相互作用增加了利息。其中一个基本问题是非线性峰值效应(通常在群植入期间发生)的影响是如何影响簇原子的速度(渗透深度)?事实上,有两个矛盾的观点。一方面,一些理论和实验研究表明,在相同速度(所谓的“清除 - 方式效应”中首先由P. Sigmund和V. 。Shulga)。另一方面,HH Andersen的最近实验表明,具有10keV /原子的铜中金属簇的均值范围是独立于簇尺寸的,而植入曲线扩大的显着增强是随着簇尺寸的增加而发生的(所谓的“尖峰扩散”效果)。为了扩展这些研究,在现有工作中,我们在每一个事件原子内植入Cu(111)的Cu_n簇(n = 1,6,13,55)的原子的投影范围分布的系统计算,在(100 ... 1000)EV / ATOM。通过经典分子动力学(MD)方法进行仿真。结果表明,簇原子的平均突出范围和范围(扩展)超过相同速度的单体。同时,发现随着簇大小的增加,范围增强的效果被发现与每一个事件原子的能量的生长消失。另一方面,随着簇大小的增加,强大增强的效果并不是如此能量依赖性。讨论了负责这些效果的可能机制。

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